China’s EUV Breakthrough : A New Era for Global Innovation
Reading Time : 3 minutesChina has achieved a historic milestone by developing a working prototype of extreme ultraviolet lithography technology, challenging the global monopoly on advanced chipmaking. This monumental feat of engineering, driven by a massive mobilization of talent and resources, marks a shift toward technological independence. With a bold 2028 target for chip production, this breakthrough signals a more vibrant and competitive future.
